MEK (methyl ethyl ketone)
Features
printing ink solvent
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In-house proprietary technology
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Low moisture content and high purity
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Contains almost no alcohol (SBA, etc.) as an impurity
MEK (methyl ethyl ketone) production equipment was developed in 1985 by adopting the revolutionary direct hydration method, which has innovative features such as greatly simplifying the process, saving energy, and avoiding equipment corrosion. Born in September.
printing ink solvent
-
In-house proprietary technology
-
Low moisture content and high purity
-
Contains almost no alcohol (SBA, etc.) as an impurity
MEK (methyl ethyl ketone) production equipment was developed in 1985 by adopting the revolutionary direct hydration method, which has innovative features such as greatly simplifying the process, saving energy, and avoiding equipment corrosion. Born in September.
printing ink solvent
-
In-house proprietary technology
-
Low moisture content and high purity
-
Contains almost no alcohol (SBA, etc.) as an impurity
MEK (methyl ethyl ketone) production equipment was developed in 1985 by adopting the revolutionary direct hydration method, which has innovative features such as greatly simplifying the process, saving energy, and avoiding equipment corrosion. Born in September.
This equipment is the first in the world to use supercritical gas extraction technology to produce secondary butanol (SBA), an intermediate for MEK.
This achievement was widely recognized as contributing to the chemical industry, and in May 1990, we received the prestigious "Petroleum Institute Award" from the Japan Petroleum Institute.
MEK, which is widely used as a solvent, is produced by dehydrogenating and refining its raw material, SBA. The indirect hydration method using sulfuric acid is generally used to manufacture SBA, but there are problems such as equipment corrosion due to sulfuric acid, wastewater treatment, and complicated equipment.
In order to solve these problems, we investigated a direct hydration method using an aqueous heteropolyacid solution as a catalyst, and established a direct hydration technology for butene. At the same time, we focused on the fact that the hydration reaction conditions were under the supercritical state of butene, and established an efficient separation method for SBA by utilizing the unique vapor-liquid equilibrium relationship between butene, water, and SBA. . Due to this,
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Avoiding equipment corrosion due to sulfuric acid
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Reduced energy consumption
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Elimination of wastewater treatment and sulfuric acid treatment equipment
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Equipment simplification
A new butene hydration process with excellent features has been completed.
Purpose
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Contains almost no raw materials for manufacturing organic synthetic products (methyl ethyl ketoxime, methyl ethyl ketone peroxide, methyl ionone, etc.)
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paint solvent
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Solvents such as adhesives and printing inks
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resin processing solvent
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Various extraction solvents (dewaxing solvents, etc.)
Packing
Ship, lorry, drum (165kg)
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The data presented in this document are representative of measurements obtained under specific conditions.
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The uses described in this document do not guarantee the results of applying this product to those uses.
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When using the product for the purposes introduced in this document, please be careful about infringing on industrial property rights (patent rights, utility model rights, design rights, trademark rights). Our company is not responsible for infringement of industrial property rights.
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Please note that the contents of this document are subject to change without notice due to improvements.
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Since this product is for industrial use, we do not guarantee the quality or safety for medical devices, pharmaceutical packaging, pharmaceuticals, quasi-drugs, cosmetics, or food applications.
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When making an inquiry, please select "Petrochemical" as the inquiry category.